ASTM F2113-01e1 PDF
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Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
standard by ASTM International, 06/10/2001
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.
1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Product Details
- Published:
- 06/10/2001
- Number of Pages:
- 2
- File Size:
- 1 file , 38 KB
- Note:
- This product is unavailable in Russia, Ukraine, Belarus
